| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38ed56a4b4e8e2315b2b3308bffedb3f |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-70341 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate |
2004-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2010-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3abc82d995c753a5699e25c3fe50f8ec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5719b5ace1d9eddf581c899aa9e459ca
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ec907ab9238d95d4ee9fb668ae802d8 |
| publicationDate |
2010-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7700267-B2 |
| titleOfInvention |
Immersion fluid for immersion lithography, and method of performing immersion lithography |
| abstract |
An immersion lithographic system 10 comprises an optical surface 51 , an immersion fluid 60 with a pH less than 7 contacting at least a portion of the optical surface, and a semiconductor structure 80 having a topmost photoresist layer 70 wherein a portion of the photoresist is in contact with the immersion fluid. Further, a method for illuminating a semiconductor structure 80 having a topmost photoresist layer 70 comprising the steps of: introducing an immersion fluid 60 into a space between an optical surface 51 and the photoresist layer wherein the immersion fluid has a pH of less than 7, and directing light preferably with a wavelength of less than 450 nm through the immersion fluid and onto the photoresist. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010177289-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011183273-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8802354-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8202680-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8415091-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8488102-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8597870-B2 |
| priorityDate |
2003-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |