http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7662235-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_421cadb30fc0074fe61126eb980d19d6 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-0035 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B6-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B3-12 |
| filingDate | 2005-08-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2010-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c634ad3eccfdb29049bd21c6678d59a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_26e223a62e166f9a2183b2a58ded92b2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c7c6a44f65fee6f63ad9125d0eabc7be |
| publicationDate | 2010-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-7662235-B2 |
| titleOfInvention | Method of cleaning etching apparatus |
| abstract | To provide a cleaning method for an etching apparatus for a metal film that efficiently removes an etching residue deposited in an etching process chamber, assures the reproducibility of the etching performance, and keeps the etching process chamber in a low-dust-emission condition. n Each time one workpiece with a metal film is etched (S 1 ), the interior of the vacuum chamber is cleaned by replacing the workpiece with a dummy substrate (S 2 ), performing a first step of plasma processing using oxygen (O 2 ) and carbon tetrafluoride (CF 4 ) to remove a carbon-based deposit pile (S 3 ), and performing a second step of plasma processing using boron trichloride (BCl 3 ) and chlorine (Cl 2 ) to remove a residue that could not be removed by the first step and an etching residue of the metal film (S 4 ). |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8500912-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104882360-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8298957-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009233450-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10822694-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11289312-B2 |
| priorityDate | 2005-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 48.