Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fc5a95a340c0ea0ffe3d35f49b52bea0 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76879 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76867 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76864 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76871 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-288 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76849 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1844 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1608 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76814 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76868 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76874 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-7685 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76861 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-34 |
filingDate |
2006-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2010-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e6f29b48f328df6c16032f6e90bdf23 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9cf4bcc7a305c420010ce33b56806614 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e13a79d4a65906e8f6b31f1e64d72a9a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f4d64fd69d590efc9991e4fed8da59bb |
publicationDate |
2010-02-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-7655081-B2 |
titleOfInvention |
Plating bath and surface treatment compositions for thin film deposition |
abstract |
An aqueous substrate surface treatment composition includes cysteine and an acidic solution having a pH of about 7 or less. The composition enables a selective deposition of a metal ion sensitizer and a subsequent selective plating of a metallic cap layer. Various CoWP plating bath compositions are also provided which may be used to form the cap layer. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8454859-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011124191-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10867843-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008023793-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9062378-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8232621-B2 |
priorityDate |
2005-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |