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publicationDate 2009-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-7524552-B2
titleOfInvention Copper foil provided with dielectric layer for forming capacitor layer, copper clad laminate for formation of capacitor layer using such copper foil with dielectric layer, and method for manufacturing producing such copper foil with dielectric layer for formation of capacitor layer
abstract To provide a dielectric-layer-provided copper foil or the like for extremely improving the product yield while making the most use of the increase effect of an electric capacity of a thin dielectric layer using the sputtering vapor deposition method. n In the case of dielectric-layer-provided copper foils respectively having a dielectric layer on one side of a copper foil, the dielectric layer 6 is an inorganic-oxide sputter film having a thickness of 1.0 μm or less and formed on the one side of the copper foil in accordance with the sputtering vapor deposition method and the dielectric-layer-provided copper foils for respectively forming a capacitor layer, characterized in that a pit-like defective portion generated on the inorganic-oxide sputter film is sealed by polyimide resin are used.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017117096-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9564270-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9818539-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8274779-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9620291-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10062507-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010271748-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10014113-B2
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