| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e415f6f1eeb8706d299ea086326248bf |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-121
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S522-913 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2006-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2009-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ce51c74bac8acbf1befc9d435ca3676
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e6342379f267837e4951da7476d052b4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_12e54befea21c905c0a5610502e28ff7 |
| publicationDate |
2009-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7482107-B2 |
| titleOfInvention |
Photoresist composition |
| abstract |
Photoresist compositions having a resin binder with an acid labile blocking group with an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8394573-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8535872-B2 |
| priorityDate |
1997-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |