http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7465597-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2be22659af828fe9bc0bca9ebd23fcd2 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F9-00 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N27-3272 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C12Q1-001 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 |
| filingDate | 2006-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2008-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9fdf1afc68e8e4899e635d109d16a4d1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_668205491aa567ef06f566e6d6489c8e |
| publicationDate | 2008-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-7465597-B2 |
| titleOfInvention | Method of manufacturing a diagnostic test strip |
| abstract | A method for manufacturing a biosensor is provided. The method may include positioning a shadow mask containing a pattern of a plurality of feature sets over a substantially planar base layer containing a plurality of registration points. The method may also include forming at least one of the plurality of feature sets on the substantially planar base layer by selectively depositing a layer of a conductive material on the substantially planar base layer by passing the conductive material through the pattern of the shadow mask and removing the shadow mask from the substantially planar base layer. Alternatively, the method may include providing a laminate structure including a substantially planar base layer containing a plurality of registration points and a photoresist layer containing a pattern of a plurality of feature sets. The method may further include forming at least one of the plurality of feature sets on the substantially planar base layer by selectively depositing a layer of a conductive material on the substantially planar base layer by passing the conductive material through the pattern of the photoresist layer and removing the photoresist layer from the substantially planar base layer. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11624723-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11630075-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8701282-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-202010003970-U1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011236959-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009280551-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9506890-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10781513-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10378098-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010021659-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10197522-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2365329-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9046480-B2 |
| priorityDate | 2006-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 63.