| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fd83260a96356882b5f50dd097411a72 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76801 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02137
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31633
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02362 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-0336
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-522
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
| filingDate |
2006-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2008-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_583d556ce2bc4fee56c4c2a1a349c748
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3925cfd22b98063e5123c7745bbb9c4b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_775cd8e298b29c541fc7e766e59ba4a4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7b01f68cb35ec94196b61e78fb70dc0e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fc560be91475c8517df195dfee74d0a4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bff9e4317279eb5d270e0aff201d8f30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3108e70f90b7e227861dd0e7f59fabbe |
| publicationDate |
2008-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7420279-B2 |
| titleOfInvention |
Carbon containing silicon oxide film having high ashing tolerance and adhesion |
| abstract |
An insulating film used for an interlayer insulating film of a semiconductor device and having a low dielectric constant. The insulating film comprises a carbon containing silicon oxide (SiOCH) film which has Si—CH2 bond therein. The proportion of Si—CH2 bond (1360 cm−1) to Si—CH3 bond (1270 cm−1) in the insulating film is preferably in a range from 0.03 to 0.05 measured as a peak height ratio of FTIR spectrum. The insulating film according to the present invention has higher ashing tolerance and improved adhesion to SiO2 film, when compared with the conventional SiOCH film which only has CH3 group. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9433446-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9295500-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8202274-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8777954-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8454664-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8206395-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8845640-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9962196-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8512383-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8142437-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10639081-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8167887-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8394108-B2 |
| priorityDate |
2003-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |