http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7391500-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fd83260a96356882b5f50dd097411a72 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-70341 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03B27-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03B19-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate | 2005-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2008-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6aed4cc15199b0236de2acd015d25a4b |
| publicationDate | 2008-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-7391500-B2 |
| titleOfInvention | Light exposure apparatus and method of light exposure using immersion lithography with saturated cyclic hydrocarbon liquid |
| abstract | In view of stably forming resist patterns with an excellent resolution, a light exposure apparatus 100 comprises a light source 101 irradiating a mask 102 with light, a projection optical system 103 projecting an image of the mask 102 onto a wafer 110 , and a liquid supply unit 105 filling a liquid medium 109 between the projection optical system 103 and the wafer 110 . A saturated cyclic hydrocarbon or its derivative is used as the liquid medium 109. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10962418-B1 |
| priorityDate | 2004-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 77.