| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 |
| filingDate |
2007-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2008-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_44abe896688ed30a019a8ac9809792bf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4fd220c8e594f4d931fdf5226b401ff4 |
| publicationDate |
2008-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7371501-B2 |
| titleOfInvention |
Photosensitive resin composition and method for manufacturing semiconductor apparatus using the same |
| abstract |
A photosensitive resin composition comprises: a polybenzoxazole precursor (A); a naphthoquinone diazide photosensitizer (B); and a specific phenolic hydroxyl group-containing compound (C). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11572442-B2 |
| priorityDate |
2006-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |