| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cef1f43aa7ea51e6a592082d9f2a3103
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0e433c1625fc509a087c912b440da84b |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76834 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76814
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3128
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76826
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76831
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28562
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76807 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-4763 |
| filingDate |
2005-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2008-05-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d15ed5350f418db7e989628fc9066053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f0c98030113c652d203fd1bec44e024 |
| publicationDate |
2008-05-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7368377-B2 |
| titleOfInvention |
Method for selective deposition of a thin self-assembled monolayer |
| abstract |
A method for selective deposition of self-assembled monolayers to the surface of a substrate for use as a diffusion barrier layer in interconnect structures is provided comprising the steps of depositing a first self-assembled monolayer to said surface, depositing a second self-assembled monolayer to the non-covered parts of said surface and subsequently heating said substrate to remove the first self-assembled monolayer. The method of selective deposition of self-assembled monolayers is applied for the use as diffusion barrier layers in a (dual) damascene structure for integrated circuits. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015380302-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018061750-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017323781-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10211138-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10879107-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7964878-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9418889-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2020144107-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10049974-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013221524-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10283404-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018269144-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010134052-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11342222-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10998263-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8871601-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10366878-B2 |
| priorityDate |
2004-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |