| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2f8cfa5aee4410611b5c562275c9f8e3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-109 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D311-94
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D313-20 |
| filingDate |
2001-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2006-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f86acb7c8c3a71ea9c9a882d2e0d74e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_636b690f5d0e05d54fe1840deafc8739
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9f8061575e5390c353b43cdd92a0537
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_622f6b4ef85ef781830221462ee3f9ff |
| publicationDate |
2006-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7105268-B2 |
| titleOfInvention |
Polymer for photoresist and resin compositions therefor |
| abstract |
A polymeric compound for photoresist of the invention includes at least one monomer unit represented by following Formula (I): n nwherein R 1 , R 2 , R 3 , R 4 and R 5 are the same or different and are each a hydrogen atom or a methyl group; m, p and q each denote an integer of from 0 to 2; and n denotes 0 or 1, where the hydroxyl group and carbonyloxy group extending from a principle chain in the formula are independently combined with either of two carbon atoms on the far-left portion of the rings.n n By using the polymeric compound for photoresist as a base of a photoresist, the resulting photoresist exhibits well-rounded adhesion to substrates and resistance to etching. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7858286-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008085464-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009098483-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7629107-B2 |
| priorityDate |
2000-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |