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filingDate 2005-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2006-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2006-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-7101747-B2
titleOfInvention Dual work function metal gates and methods of forming
abstract Complementary transistors and methods of forming the complementary transistors on a semiconductor assembly are described. The transistors can be formed from a metal silicon compound deficient of silicon bonding atoms on a dielectric material overlying a semiconductor substrate conductively doped for PMOS and NMOS regions. The metal silicon compound overlying the NMOS region is converted to a metal silicon nitride and the metal silicon compound overlying the PMOS region is converted to a metal silicide. NMOS transistor gate electrodes comprising metal silicon nitride and PMOS transistor gate electrodes comprising metal silicide can be formed.
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priorityDate 2003-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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