| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4903b7b4b84e3b845aef791cad8f2e97 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31612
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24942
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2218-33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2218-152
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2217-91
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24355
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2217-213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-315 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31629
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02131
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-245
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C15-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-3694 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25F3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-245
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C15-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 |
| filingDate |
2001-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2006-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6cc2845c592713dd5836e00db32f00a2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5f55b946f8ec9d413ddffde6666fac8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f7a9a416b16e88333c6d21dba6602c6 |
| publicationDate |
2006-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6984436-B2 |
| titleOfInvention |
Graded material and method for synthesis thereof and method for processing thereof |
| abstract |
In homogeneous materials, etching characteristics depend on properties inherent in these materials regardless of whether they are isotropic or anisotropic, and there have been limitations in realizing various desired shapes. A subject for the invention is to provide a gradient material which eliminates these limitations. n A gradient material is provided in which the rate of etching with a specific chemical substance changes continuously or by steps from the outermost surface to an inner part thereof. This gradient material is made of a main material which contains an additive capable of changing the etching rate of the main material so that the concentration of the additive changes continuously or by steps. Especially when a glass material containing SiO 2 as the main component is used as the main material and fluorine is used as the additive, then a gradient material in which the rate of etching with an aqueous solution of hydrofluoric acid changes in the depth direction can be obtained. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010206230-A1 |
| priorityDate |
2000-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |