http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6916597-B2

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publicationDate 2005-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6916597-B2
titleOfInvention Method for fabricating a resist pattern, a method for patterning a thin film and a method for manufacturing a micro device
abstract A thin film to be milled is formed on a substrate 1 , and thereafter, a polymethylglutarimide layer and a photoresist layer are coated. Then, the photoresist layer is exposed and developed via a given mask, to form a pre-resist pattern. Then, ashing treatment is performed for the pre-resist pattern to a narrowed resist pattern. Subsequently, the thin film to be milled is milled via the resist pattern to obtain a patterned thin film.
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