http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6902681-B2

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28123
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31122
classificationIPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
filingDate 2002-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2005-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d73fddeb26fc0eb13bbd594190fec5ec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_20bff001dee27104bc6fe42f2d5f9d93
publicationDate 2005-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6902681-B2
titleOfInvention Method for plasma etching of high-K dielectric materials
abstract A method of etching high dielectric constant materials (a material with a dielectric constant greater than 4) using a halogen gas, reducing gas, and passivating gas chemistry. An embodiment of the method is accomplished using chlorine, carbon monoxide, and nitrogen to etch and passivate a hafnium dioxide layer.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011143488-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8119210-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7837838-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007004152-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8486748-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7498226-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7902018-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7446050-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7964512-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8722547-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005032386-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7645710-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009035928-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7678710-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007042601-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007249182-A1
priorityDate 2002-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6326261-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004007561-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5188979-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0151072-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6271115-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5071714-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5337207-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5667700-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0197257-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6040248-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5356833-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003170986-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002072016-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002075972-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6204141-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6368517-B1
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559516
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID281
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556970
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID166703
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID448362446
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707785
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID292779
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID947
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419520488
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458427267
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID62395
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID313

Total number of triples: 59.