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publicationDate 2005-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6875544-B1
titleOfInvention Method for the fabrication of three-dimensional microstructures by deep X-ray lithography
abstract A method for the fabrication of three-dimensional microstructures by deep X-ray lithography (DXRL) comprises a masking process that uses a patterned mask with inclined mask holes and off-normal exposures with a DXRL beam aligned with the inclined mask holes. Microstructural features that are oriented in different directions can be obtained by using multiple off-normal exposures through additional mask holes having different orientations. Various methods can be used to block the non-aligned mask holes from the beam when using multiple exposures. A method for fabricating a precision 3D X-ray mask comprises forming an intermediate mask and a master mask on a common support membrane.
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