Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36d1d9c59848bff6ad5f55923d1290f5 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-40117 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B69-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7923 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66545 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B43-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-42352 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-513 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-26586 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-42368 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66833 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66583 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7833 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-336 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8247 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-792 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-788 |
filingDate |
2003-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2005-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8b97d8ebdd5f45d8347959611f8e714e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8faf46099e6829101098e337b07546dd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2dc83603156ea3119308d9632b4ac94e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c6e2a804b6f943f965324a41d3ef66e |
publicationDate |
2005-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-6867455-B2 |
titleOfInvention |
Semiconductor device with a metal insulator semiconductor transistor |
abstract |
A semiconductor device capable of holding multibit information in one memory cell, and a method of manufacturing the semiconductor device. A trench is formed in a channel portion of an MONOS transistor. Then, a source side portion and a drain side portion in a silicon nitride film of a gate insulating film which interpose the trench are caused to function as first and second electric charge holding portions capable of holding electric charges. In the case in which first electric charges are trapped on the drain side and second electric charges are trapped on the source side, a portion of a gate electrode in the trench functions as a shield. If a fixed potential is given to the gate electrode, the second electric charge holding portion is not influenced by an electric field induced by the first electric charges so that the trapping of the second electric charges is not inhibited. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009020799-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006192249-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7292478-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007063268-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010221876-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8168492-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004104425-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8357965-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7442989-B2 |
priorityDate |
2002-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |