| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3299
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01Q7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01Q21-29 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01Q7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01Q21-29
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01Q1-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01Q11-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate |
2002-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2005-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0e7fdb16485259bce3b43ef57a1d4c7b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9759a58d1f11d91f72772f86db16de96
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_73cd608607f3e7b345a1c852793f4b16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d04c5336e819b71017c55d966ae3260 |
| publicationDate |
2005-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6842147-B2 |
| titleOfInvention |
Method and apparatus for producing uniform processing rates |
| abstract |
An antenna arrangement for generating an rf field distribution at a plasma generating region inside a chamber wall of a process chamber of a plasma processing apparatus is described. The antenna arrangement includes an rf inductive antenna to which an rf power supply can be connected to supply an rf current to generate a first rf field extending into the plasma generating region. A passive antenna is also provided which is inductively coupled to the rf inductive antenna and configured to generate a second rf field modifying the first rf field. The rf field distribution at the plasma generating region increases the processing uniformity of the processing apparatus compared to that in the absence of the passive antenna. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004079485-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010252200-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9337004-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8298949-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010173496-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8671878-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012138229-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7079085-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9039865-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012247680-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011108194-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7381292-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004223579-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8691048-B2 |
| priorityDate |
2002-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |