http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6759341-B1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_df2c3aa5e68d585532c3f7dc2ca14791
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02021
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68764
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68771
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-687
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
filingDate 2003-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2004-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8821ddd21697fc3060ea93579743709b
publicationDate 2004-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6759341-B1
titleOfInvention Wafering method comprising a plasma etch with a gas emitting wafer holder
abstract To reduce the edge roll off in a semiconductor wafering process, the wafer ( 110 ) is subject to a plasma etch with an edge underetch. The edge underetch is achieved by means of a wafer holder ( 410 ) that emits gas towards the wafer (e.g. a gas vortex) to draw the wafer towards the holder's body ( 460 ). The plasma impinges on the wafer surface ( 110.1 ) opposite to the body. Some of the gas emitted by the holder wraps around the wafer edge and dilutes the etchant near the wafer edge. Consequently, the etch proceeds slower near the edge (the edge is underetched). In some embodiments, the wafer is rotated around an axis ( 440 ) passing through the wafer to increase the underetch.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012129318-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101872735-A
priorityDate 2003-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6203661-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6294469-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6184060-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002187595-A1
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID123854965
http://rdf.ncbi.nlm.nih.gov/pubchem/anatomy/ANATOMYID9612
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/taxonomy/TAXID9612
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID129823890

Total number of triples: 31.