Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_444d3641747bb086afc4ad00c49f770b |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0385 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
filingDate |
2001-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2004-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_026d6354557481455a9dc267d71e669a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad51a9450b59a998a1b02376f2610af9 |
publicationDate |
2004-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-6716568-B1 |
titleOfInvention |
Epoxy photoresist composition with improved cracking resistance |
abstract |
A photoimageable composition suitable for use as a negative photoresist comprising about 75% to about 95% by weight of at least one epoxidized polyfunctional bisphenol A formaldehyde novolak resin; about 5% to about 25% by weight of at least one polyol reactive diluent; and at least one photoacid generator in an amount from about 2.5 to about 12.5 parts per hundred parts of resin and reactive diluent, which initiates polymerization upon exposure to near-ultraviolet radiation; dissolved in a sufficient amount of coating solvent. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014315295-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7571979-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7449280-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7654637-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11613115-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111007696-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111007696-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013059308-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-4101517-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008241735-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11175279-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8916622-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7910292-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3777994-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014085625-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012327364-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009269707-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011513799-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014102465-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014102464-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014102467-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014102466-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8007990-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010068649-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005266335-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007076059-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007076060-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2005119364-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2005119364-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8288078-B2 |
priorityDate |
2000-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |