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filingDate 2001-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2004-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4841fc8647f7710f1b79e9fe48d40597
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publicationDate 2004-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6689529-B2
titleOfInvention Method for measuring diffusion of photogenerated catalyst in chemically amplified resists
abstract A method of imaging acid in a chemically amplified photoresist comprising the steps of: (a) exposing the chemically amplified photoresist to radiation thereby generating an acid, the chemically amplified photoresist comprising at least one species of pH-dependent fluorophore that fluoresces in the presence of the acid, the pH-dependent fluorophore being present at a concentration that enables the fluorescence from individual molecules of the pH-dependent fluorophore to be individually resolved; and (b) generating an image of the acid in the photoresist, the image comprising at least one or a plurality of discrete points corresponding to the fluorescent emission from an individual molecule or molecules of the pH-dependent fluorophore.
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