| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-029
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0295 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-035
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-035
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
| filingDate |
2001-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2004-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_03bdd4988ee5d65414fb17d6fd6346f7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c9eef380cc4cb630967a97a8eab3259
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0cf544b8e6cea96e07906d131aaca220
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a6e0535a31276b3228feaf6432525818 |
| publicationDate |
2004-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6686126-B2 |
| titleOfInvention |
Developing solution for photosensitive lithographic printing plate, plate-making method of lithographic printing plate, and photosensitive lithographic printing plate |
| abstract |
A plate-making method of a lithographic printing plate is disclosed, which comprises the steps of exposure of a photo-sensitive lithographic printing plate having the acid value of a photosensitive layer of 1.0 meq/g or less with a laser beam, and then development with a developing solution having a pH value of 13.0 or less at a developing speed in an unexposed domain of 0.05 mum/s or more and at an osmotic speed of a developing solution in an exposed domain of 0.1 mum/s or less. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005250058-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006257789-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8067145-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006257798-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7186497-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006210923-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005208426-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007178414-A1 |
| priorityDate |
2000-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |