patent/US-6638859-B2

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filingDate	2002-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate	2003-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor	http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8955d1f0b5d68cd2e4ece42d26cc1d3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5a3b0552480520375d437126438ce72a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78825064d8b9f2c4ff9a7f5fcd71fd7e
publicationDate	2003-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber	US-6638859-B2
titleOfInvention	Apparatus and method to achieve continuous interface and ultrathin film during atomic layer deposition
abstract	A method and apparatus for performing atomic layer deposition in which a surface of a substrate is pretreated to make the surface of the substrate reactive for performing atomic layer deposition.
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