http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6620699-B2

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6623826fb005ec2357960fdc6dcc8490
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B12-0383
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B12-488
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66181
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B12-395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B12-053
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8242
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-108
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-334
filingDate 2001-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2003-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0554afafe53c6b46fb188466b4cfdde2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ccc008fdcca488b75e8aa8b9fb279132
publicationDate 2003-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6620699-B2
titleOfInvention Method for forming inside nitride spacer for deep trench device DRAM cell
abstract A method is provided for forming an inside nitride spacer in a deep trench device DRAM cell. The method includes depositing an oxide liner in a trench etched from a semiconductor material, wherein the oxide lines abuts a pad nitride layer, a pad oxide layer under the pad nitride layer, and a recessed gate poly in the trench. The method further includes depositing a spacer material on the oxide liner, removing exposed portions of the oxide layer from the semiconductor, and depositing a poly stud material over the semiconductor wherein the spacer material is encapsulated in poly stud material. The method includes polishing the semiconductor to the top trench oxide layer, and etching the top trench oxide layer.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7078290-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005202634-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006228861-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7256441-B2
priorityDate 2001-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6008104-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/taxonomy/TAXID363212
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419579069
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559478
http://rdf.ncbi.nlm.nih.gov/pubchem/anatomy/ANATOMYID363212
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24823

Total number of triples: 29.