Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eedd2a00c4d0ba56ecf05fb4b97592dd |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L2201-08 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J9-142 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-06 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D4-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
filingDate |
2002-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2003-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab7570a626d39cb1bb42de66916bddfd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2afb70c4f477452fe08fee437ea02f32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b9728ebe56022cee0f524a7c886eb156 |
publicationDate |
2003-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-6602643-B2 |
titleOfInvention |
Ultraviolet-curable resin composition |
abstract |
An ultraviolet-curable resin composition comprising a phosphorus atom-containing photopolymerizable compound and a carboxyl group-containing photopolymerizable compound and exhibiting surface tension at 25° C. in the range of 30 to 50 mN/m. Preferably the composition comprises (a) a compound having one or more (meth)acryloyl groups in its molecule and a phosphorus atom, (b) a compound having at least one carboxyl group and one (meth)acryloyl group in its molecule, (c) a compound having one or more (meth)acryloyl groups in its molecule, (d) a leveling agent, and (e) a photoinitiator. The ultraviolet-curable resin composition is useful as a protective material for etching, particularly as a back-coating material in the production of a shadow mask. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7592121-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005167395-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7824823-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8021740-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008166545-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009286003-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006063113-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011236959-A1 |
priorityDate |
1999-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |