| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c3a2f00e72ba6e4c09b6da573427fbed |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28247
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-4941
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28061 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-49
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 |
| filingDate |
2001-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2003-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5cc404f978506f8351fb532e12b15537
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dee8e89f6ca0c523da54533ab4dcbbf7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0e51cc773333c4d73784184d09c524d2 |
| publicationDate |
2003-07-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6592777-B2 |
| titleOfInvention |
Manufacture and cleaning of a semiconductor |
| abstract |
Metal nitride and metal oxynitride extrusions often form on metal silicides. These extrusions can cause short circuits and degrade processing yields. The present invention discloses a method of selectively removing such extrusions. In one embodiment, a novel wet etch comprising an oxidizing agent and a chelating agent selectively removes the extrusions from a wordline in a memory array. In another embodiment, the wet etch includes a base that adjusts the pH of the etch to selectively remove certain extrusions relative to other substances in the wordline. Accordingly new metal silicide structures can be used to form novel wordlines and other types of integrated circuits. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7211200-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6933580-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010019292-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9006703-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003151021-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7700496-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6849544-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7129188-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005143270-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006189148-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005170623-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006199395-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8637942-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003207556-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7192910-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006226122-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7977228-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003155782-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7015151-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6890867-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008003794-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100663357-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004124530-A1 |
| priorityDate |
1999-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |