Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d1d01f6fc6a8e81cf60813f0693f6cb8 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02271 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31633 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 |
filingDate |
2001-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2003-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_97f7e7a1e4f8e9c09c1c0505d5fc5731 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bafd4b50e614e1125d0aef5a0c69a876 |
publicationDate |
2003-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-6562735-B1 |
titleOfInvention |
Control of reaction rate in formation of low k carbon-containing silicon oxide dielectric material using organosilane, unsubstituted silane, and hydrogen peroxide reactants |
abstract |
Control of a reaction between a peroxide oxidizing agent and a carbon-substituted silane to form a low k carbon-containing silicon oxide dielectric material is achieved, in a first embodiment, by adding, to the carbon-substituted silane reactant, silane (SiH 4 ), to accelerate the process for forming a low k carbon-containing silicon oxide dielectric material by reaction of the carbon-substituted silane/silane mixture with hydrogen peroxide. Also, control of a reaction between a peroxide oxidizing agent and a carbon-substituted silane to form a low k carbon-containing silicon oxide dielectric material is achieved by controlling the ratio of the flow of the hydrogen peroxide reactant and the flow of the reactant mixture of carbon-substituted silane and unsubstituted silane into the reaction chamber though structural modification of the faceplate (showerhead) through which the reactants flow into the chamber. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101971322-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9431238-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006021703-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101451237-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010112191-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004033703-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8124545-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10343907-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010221916-A1 |
priorityDate |
2001-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |