| abstract |
A ferroelectric and dielectric source solution for use in chemical vapor deposition processes includes a ferroelectric/dielectric chemical vapor deposition precursor; and a solvent for carrying the ferroelectric/dielectric chemical vapor deposition precursor taken from the group of solvents consisting essentially of type A solvents, including tetraglyme, triglyme, triethylenetetramine, N,N,N',N'-tetramethylethylenediamine; N,N,N',N',N'',N''-pentamethyldiethylenetriamine; and 2,2'-bipyridine; type B solvents including tetrahydrofuran, butyl ethyl ether, tert-butyl ethyl ether, butyl ether, and pentyl ether; and type C solvents including iso-propanol, 2-butanol, 2-ethyl-1-hexanol, 2-pentanol, toluene, xylene and butyl acetate; and mixtures of solvent types A, B and C. |