| abstract |
On a SIMOX substrate having a plurality of STI layers and first conductivity type semiconductor layers disposed in the row direction, a stacked-layer structure SS is formed on a gate dielectric film formed on the first conductivity type semiconductor layer, the structure SS being made of a first polysilicon film, a second gate dielectric film and a second polysilicon film. Second conductivity type source and drain regions are formed in the first conductivity type semiconductor layer on both sides of the structure SS. In a plurality of source regions adjacent in the column direction between the stacked-layer structures SS, a common source line CSL is formed which is made of second conductivity type source region connecting semiconductor regions, source regions and conductive films formed on these semiconductor and source regions. |