| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fa1b9ebfcd0a9eea7ab4f03b347cfb5c |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3342 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-427
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02071
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32935
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32963 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 |
| filingDate |
1999-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2002-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_905fea5d9cd794b1f273b394b1c0bf27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cfebfb0ad5a2c0564bb6ecee84b49de1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cfd9d200f0361acc8c9fd17a13115318
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66f1c1468ffe2d991da78a32048646b0 |
| publicationDate |
2002-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6492186-B1 |
| titleOfInvention |
Method for detecting an endpoint for an oxygen free plasma process |
| abstract |
A method for determining an endpoint for an oxygen free plasma stripping process for use in semiconductor wafer processing. The method comprises exciting a gas composition containing a nitrogen gas and a reactive gas to form the oxygen free plasma. The oxygen free plasma reacts with a substrate having a photoresist and/or residues thereon to produce emitted light signals corresponding to an oxygen free reaction product. The endpoint is determined by optically measuring a primary emission signal of the oxygen free reaction product at a wavelength of about 387 nm. The endpoint is determined when the plasma no longer reacts with the photoresist and/or residues on the substrate to produce the emitted light at about 387 nm, an indication that the photoresist and/or residues have been removed from the wafer. Secondary emission signals of the oxygen free reaction product at about 358 nm and 431 nm can also be monitored for determining the endpoint. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004238123-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004195208-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010055807-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11605567-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006234511-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006093731-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007272359-A1
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8591659-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005199627-A1
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004238489-A1
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9129778-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007254489-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018188112-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004144491-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8268181-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8580076-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009000547-A1 |
| priorityDate |
1999-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |