| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2001-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2002-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4ec44fcf42e2b4b7d89fa497446a14a2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_41beefffc0835c7410b7f3f03c07e541
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b10edcde978e09e0b6068ac9f1cffd65
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_267073732a7289cf9ab15197a1f88305 |
| publicationDate |
2002-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6488863-B2 |
| titleOfInvention |
Plasma etching method |
| abstract |
An etching gas is supplied into a process chamber and turned into plasma so as to etch a silicon nitride film arranged on a field silicon oxide film on a wafer (w). A mixture gas containing at least CH2F2 gas and O2 gas is used as the etching gas. Parameters for planar uniformity, by which the etching apparatus is set in light of a set value of the planar uniformity, include the process pressure and the mixture ratio (CH2F2/O2) of the mixture gas. As the set value of the planar uniformity is more strict, either one of the process pressure and the mixture ratio is set higher. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6921720-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004261721-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003037882-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017338084-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8747559-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7993460-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10103011-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002020494-A1 |
| priorityDate |
1996-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |