| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c3a2f00e72ba6e4c09b6da573427fbed |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76802 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 |
| filingDate |
2001-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2002-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_587e1b95949f4f25fd27baa710efa458
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ccfa151857135548105e177b4f6cae3 |
| publicationDate |
2002-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6475920-B2 |
| titleOfInvention |
Plasma etching method using low ionization potential gas |
| abstract |
An etching method for forming an opening includes providing a substrate assembly having a surface and an oxide layer thereon. A patterned mask layer is provided over the oxide layer exposing a portion of the oxide layer. A plasma including one or more of CxHyFz+ ions and CxFz+ ions and further including xenon or krypton ions is used to etch the oxide layer at the exposed portion to define the opening in the oxide layer while simultaneously depositing a polymeric residue on a surface defining the opening. The etching is continued until the opening in the oxide layer is selectively etched to the surface of the substrate assembly. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9190316-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8614151-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012269372-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7670958-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8419958-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7608195-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007034603-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010038796-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8093725-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010213172-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013105996-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007193975-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9088850-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007197033-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007190803-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101019928-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9559252-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101019930-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006189098-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004219790-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7279429-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016111374-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7713430-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7846846-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9633948-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7675179-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009176375-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7932111-B2 |
| priorityDate |
1998-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |