Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b7317808024e524eea40a6c5a5ad6a22 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2855 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-20 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 |
filingDate |
2000-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2002-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_decaa5e384af2703e343e78772108c7c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96ed341b987d020ade493dfd5e86ba08 |
publicationDate |
2002-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-6440831-B1 |
titleOfInvention |
Ionized metal plasma deposition process having enhanced via sidewall coverage |
abstract |
A method for depositing an adhesion layer in a contact region on a semiconductor substrate provides for sufficient coverage on the bottom and sidewalls of the contact region. In an example embodiment, a contact region having a bottom and sidewalls has a first coat of the adhesion layer deposited thereon at a thickness greater than the thickness on the sidewall. To compensate for the narrower adhesion layer thickness on the sidewalls, a second coat of the adhesion layer is deposited so that the second coat on the sidewalls is at a thickness greater than the second coat thickness on the bottom. The adhesion layer is titanium nitride although other materials may be used as well. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10261466-B4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6841468-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004137714-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-10261466-A1 |
priorityDate |
2000-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |