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publicationNumber US-6029679-A
titleOfInvention Semiconductor cleaning and production methods using a film repulsing fine particle contaminants
abstract By employing a cleaning method wherein a substrate such as Si wafer is covered with a film having electrostatic repulsive force or a substance capable of controlling a zeta potential so as to prevent or remarkably reduce adhesion of fine particles present in a cleaning solution or etching solution, electronic parts can be produced in higher yield and lower cost.
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