| abstract |
A photosensitive composition for forming a pattern through a light-exposure with either one of ArF excimer laser and F2 excimer laser, which comprises a compound having either an acid-decomposable or acid-crosslinkable group, and a compound represented by the following general formula (1): <IMAGE> (1) wherein Ar1 and Ar2 are individually an aromatic ring or condensed aromatic ring, R1 and R2 are individually halogen atoms or monovalent organic group, X is a group selected from the group consisting of CF3SO3, CH3SO3, CF3COOH, ClO4, SbF6 and AsF6, Z is a group selected from the group consisting of Cl, Br, I, S-R and Se-R (R is an alkyl group having 1 to 10 carbon atoms or perfluoroalkyl group having 1 to 10 carbon atoms), and m and n are 0 or a positive integer. |