| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e415f6f1eeb8706d299ea086326248bf |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
1997-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1999-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4ad9499fb9590800b0c39ddacca12db
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e6342379f267837e4951da7476d052b4 |
| publicationDate |
1999-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-5858605-A |
| titleOfInvention |
Acid labile photoactive composition |
| abstract |
A photoresist composition comprising an alkali soluble resin and the reaction product of an ortho-naphthoquinone diazide sulfonic acid ester and a vinyl ether. In use, the photoresist is characterized by having at least a portion of the hydroxyl groups on the alkali soluble resin reacted with the photoactive compound and then deblocked by acid generation. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013258632-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112166378-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9357645-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019224248-A1 |
| priorityDate |
1997-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |