| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24783023a6abd1388dac7452a81e363a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C10-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C8-42 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C10-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C8-42 |
| filingDate |
1997-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1998-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_250359d8ccf73246af0865077ee52672
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6287af9af5e80741807d50b9c88c03ec |
| publicationDate |
1998-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-5851315-A |
| titleOfInvention |
Process for producing radioisotope source |
| abstract |
A process for implanting radioisotope ions into a substrate to create a radioisotope source, utilizing the chemical binding of selected ions to the surface of the substrate. Extraneous material not chemically bound to the substrate is removed and the chemically bound ions are diffused below the surface of the substrate in a non-oxidizing environment. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6676988-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008058580-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6064070-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6440487-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7686756-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6709693-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6264595-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002169353-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005163915-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6475644-B1 |
| priorityDate |
1997-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |