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filingDate 1967-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1971-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_352abd2c999089e548e506a42e5afb10
publicationDate 1971-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-3620794-A
titleOfInvention Method of forming a patterned radiation source
abstract Precisely patterned radiation sources are formed by exposing a base member to an inert gas radioisotope (krypton-85) at an elevated temperature and pressure to cause interstitial penetration of the atoms of the radioisotope into the lattice of the base material as controlled by a pattern formed on the surface of the base. Another procedure involved uniformly diffusing the atoms of the inert gas radioisotope into the lattice of a base material and subsequently etching portions of the surface to provide a precisely patterned radiation source.
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priorityDate 1967-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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