| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c6fb5a031082a87767d82ccdcdf2627c |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-38 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B33Y10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B33Y70-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0037 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C33-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29K105-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29K33-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29K63-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C35-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C67-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
| filingDate |
1995-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1998-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e755ac8f682e6f25cb2c906ea6437beb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_89de177a7cf867c9fd9bea1d8283d1a0 |
| publicationDate |
1998-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-5849459-A |
| titleOfInvention |
Resin composition for stereolithography |
| abstract |
A resin composition for stereolithography and a process for producing a three-dimensional object using the same. The resin composition comprises (1) a liquid photohardenable resin composition containing at least one of photo-polymerizable compounds and a photosensitive polymerization initiator, and (2) at least one of radiation energy absorbers in an amount of from 0.001 to 1.0% by weight based on the total amount of the liquid photohardenable resin composition (1). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3530676-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018046076-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6811937-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004135292-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109803989-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7189344-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7211368-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014093690-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111526977-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111526977-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10668708-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018086007-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10786435-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004054025-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11117361-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11744781-B2 |
| priorityDate |
1994-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |