| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0a6a69da5879eb83f56f6876dba3e3cf |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-128
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-117
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-126 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate |
1995-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1996-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2dbb1f8944f2986e805be903aefac579 |
| publicationDate |
1996-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-5554465-A |
| titleOfInvention |
Process for forming a pattern using a resist composition having a siloxane-bond structure |
| abstract |
The present invention provides a composition having sensitivity to light or radiation. The composition comprises a polymer having a siloxane-bond structure which undergoes polymerization reaction when irridiated with light or radiation, and a sensitizing agent. The present invention also provides a process for forming a pattern, preparing a photomask and a semiconductor device by using the composition of the present invention. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6136511-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007185262-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6361904-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005111808-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6617674-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7024093-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6842577-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005180712-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5926732-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004218889-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005141839-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-1877447-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7659050-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006275694-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005244124-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7072563-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7072565-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7072564-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010255427-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004105652-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6731857-B2 |
| priorityDate |
1990-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |