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filingDate 1994-04-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 1995-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-5437765-A
titleOfInvention Semiconductor processing
abstract A dry etch process for stripping LOCOS nitride masks (302) with fluorine based removal of oxynitride (312) followed by fluorine plus chlorine based removal of nitride (302) and any silicon buffer layer (303) without removal of pad oxide (304).
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