| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate |
1993-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1994-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_259b87c08fc9b085b3a132cec7334e40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f08ea87295ed56b59dae70df070c234
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_042dbdedb708cde8839f4a19296a08fa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_574f38ab2679b5cfa0febb692cc5b5af
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f7dd25f28318bbb719403b5297fe6fc |
| publicationDate |
1994-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-5332647-A |
| titleOfInvention |
Positive-working quinone diazide composition containing N,N',N"-substituted isocyanurate compound and associated article |
| abstract |
A positive-working photosensitive resin composition useful as a photoresist material in the fine patterning work for the manufacture of semiconductor devices is proposed. The composition is excellent in the storage stability and capable of giving a patterned resist layer having good film thickness retention, cross sectional profile of line patterns, resolution and heat resistance. The composition comprises, in addition to a conventional alkali-soluble novolac resin as a film-forming agent and a quinone diazide group containing compound as a photosensitizing agent, a specific isocyanurate compound substituted at each nitrogen atom with a hydroxy- and ter-butyl-substituted benzyl group. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7425403-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006216652-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004110096-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7332266-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006205223-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6506831-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6506441-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6517951-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1378796-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1378796-A1 |
| priorityDate |
1992-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |