Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c72d118f5664072de841f9c5c34b9d99 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-107 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K1-0284 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-056 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-62 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-70 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0002 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K1-00 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00 |
filingDate |
1990-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
1993-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4ab5959be57d7bcb709fa91b2cfae14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb899b16c0ca3a0c7984c95952fe9922 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d441b120fe73a4d81f55042982072755 |
publicationDate |
1993-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-5178976-A |
titleOfInvention |
Technique for preparing a photo-mask for imaging three-dimensional objects |
abstract |
A method for the preparation a photo-mask used for photo-imaging selected areas on the surfaces of a three-dimensional printed circuit board substrate. The photo-mask comprises an opaque layer, opaque and degradation resistant to UV light, having at least one side with a contoured shape conforming to the surface irregularities on the surfaces of the three-dimensional substrate being photo-imaged. A membrane transparent and degradation resistant to UV light, having at least one side cemented to the side of the opaque layer not in contact with the surfaces of the three-dimensional substrate being photo-imaged. A pattern of grooves positioned on the opaque layer allow transmission of UV light during the photo-imaging of the surfaces of the three-dimensiional substrate. The pattern of grooves is in accordance with a conductive metal trace pattern desired on the surfaces of the three-dimensional printed circuit board substrate. The photo-mask is prepared by first forming an opaque material layer on the surfaces of the three-dimensional substrate, followed by a membrane material to form the membrane. The pattern of grooves is created by ablating the opaque layer in selected areas by means of a laser beam from a laser moved in a boustrophedonous manner. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012125676-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6497834-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010021639-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-02076754-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5705298-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5455741-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014262798-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5764390-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6548000-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5951881-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I565831-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6214525-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003068142-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5354633-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9242412-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004069745-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022192013-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6005463-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6905621-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004218006-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8809693-B2 |
priorityDate |
1990-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |