| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02019
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30621
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
1989-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1991-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_adcae46c177c279c88695588851aaa0a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_35da0152464b3f9960973709933f69e3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87baa7cfaf055c94b04c69b40a24e590
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a940899a93fbaf7415f4eea67fccd76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6de8978a668a82ea7cab6176280abf84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ef7ced2295325cebe2f4405ab9ab460 |
| publicationDate |
1991-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-5053104-A |
| titleOfInvention |
Method of plasma etching a substrate with a gaseous organohalide compound |
| abstract |
A plasma etching process is disclosed wherein the substrate to be etched is first exposed to an etchant gas containing a volatile organohalide. When the etch rate is stabilized, the organohalide in the etchant gas is replaced by oxygen whereby the etch rate of the substrate is immediately increased to a substantially higher value. When the above is repeatedly done a substantially higher average etch rate is obtained. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6737358-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008003822-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5865900-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004099376-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6653237-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6756311-B2 |
| priorityDate |
1985-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |