http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4851506-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_79751aeaa9923745648e5ae7d9c35782 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0387 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L79-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-24 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate | 1987-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 1989-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f1a7aa7fead0bf8ca8bcb429fb051ecb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f5ea7523d9178a49181d62b43d7eaa0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e1d932384945a3ce6d3994c7d5a2d547 |
| publicationDate | 1989-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-4851506-A |
| titleOfInvention | Photostructurable polyimide mixtures |
| abstract | The present invention relates to compositions comprising n (a) at least one polyimide having an inherent viscosity of at least 0.1 dl/g (measured at 25° C. on a 0.5% by weight solution in N-methylpyrrolidone) and containing at least 50 mol % of structural units of the formula I ##STR1## in which m and p independently of one another are integers from 0 to 4, n is an integer from 0 to 3, R 1 and R 2 independently of one another are C 1 -C 6 -alkyl or C 1 -C 6 -alkoxy and R 3 is a divalent radical of an aromatic diamine which is substituted in at least one ortho-position relative to at least one N atom by alkyl, alkoxy, alkoxyalkyl, cycloalkyl or aralkyl or in which two adjacent C atoms of the aromatic radical are substituted by alkylene, and n (b) at least one aromatic polyimide which is soluble in organic solvents and photocrosslinkable and which contains at least 50 mol %, relative to the total quantity of diamine units, of radicals R 3 and at least 50 mol %, relative to the total quantity of aromatic tetracarboxylic acid units, of tetravalent aromatic tetracarboxylic acid radicals including at least one benzophenone unit. n The polyimide mixtures are distinguished by good adhesion to various substrates and have a high photosensitivity. They can be used for the production of protective coatings and relief structures and are particularly suitable for the production of etch masks. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5153303-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5446074-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5026823-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1411088-A4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6927012-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1411088-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004175646-A1 |
| priorityDate | 1986-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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