http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4808512-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_daabfabdb3db3f56b489619c6c7fbdfd |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0163 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-081 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-016 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-08 |
| filingDate | 1988-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 1989-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fdd6ca4c9e946133270e7bc58b5b034b |
| publicationDate | 1989-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-4808512-A |
| titleOfInvention | Process of deep ultra-violet imaging lithographic resist compositions |
| abstract | Photosensitive solubilization inhibitor compounds of the formula <IMAGE> wherein: x is an integer equal to the valence or functionality of the radical R, and R is a radical selected from the group consisting of the residue of a mono-, di-, tri- or polyfunctional alkanol or silicon-containing alkanol and is attached to the oxy atom of the carboxyl group through a carbon atom. Positive deep ultra-violet photoresists which are base developable comprise base soluble polymers and the photosensitive solubilization inhibition agents. Lithographic resist images are formed with the deep ultra-violet photoresists upon exposure to deep ultra-violet light. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5035979-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5034305-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5169741-A |
| priorityDate | 1986-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 152.