Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8148f503a430458f2e061ec29f1a9852 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
filingDate |
1985-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
1986-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_57330aece07e9505d98ccbb24608f5e4 |
publicationDate |
1986-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-4626491-A |
titleOfInvention |
Deep ultra-violet lithographic resist composition and process of using |
abstract |
Positive deep ultra-violet photoresists which are base developable comprise base soluble polymers and as photosensitive solubilizing agents oligomeric compounds of the formula <IMAGE> wherein X is alkylene, arylene, alkoxyalkylene or aralkylene and n is a positive integer such that the molecular weight of the oligomeric compound is from about 500 to about 3000. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5215857-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5876897-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5158855-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5039596-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4752551-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4910123-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5182185-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5198322-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5275920-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4808512-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5128230-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6228554-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4845008-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4996301-A |
priorityDate |
1983-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |