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filingDate 1985-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1986-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 1986-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-4626491-A
titleOfInvention Deep ultra-violet lithographic resist composition and process of using
abstract Positive deep ultra-violet photoresists which are base developable comprise base soluble polymers and as photosensitive solubilizing agents oligomeric compounds of the formula <IMAGE> wherein X is alkylene, arylene, alkoxyalkylene or aralkylene and n is a positive integer such that the molecular weight of the oligomeric compound is from about 500 to about 3000.
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