| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_01c1e0bc0628f76dea731cda5a666ca1 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D69-122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-202 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D69-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L77-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L67-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-00 |
| filingDate |
1987-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1988-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8ef6f8ebc2084548b6daaf2420d42f24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_163090ec4a1465be93ee959fcdc3812e |
| publicationDate |
1988-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-4740396-A |
| titleOfInvention |
Process for forming film |
| abstract |
A process for forming a built-up thin film of a high polymer which is inherently difficult of film formation by the Langmuir-Blodgett process. A high polymer is modified so as to enable film formation by the Langmuir-Blodgett process by introducing a substituent group for imparting a hydrophobic nature to a recurring unit of the high polymer, and the thus-modified high polymer is mixed with a known Langmuir-Blodgett film compound for film formation by the Langmuir-Blodgett process. A high polymer used in the present invention includes linear recurring units each of which is composed of an at least divalent first organic group R1 having at least two carbon atoms and an at least divalent second organic group R2 having at least two carbon atoms, the first organic group R1 and the second organic group R2 being connected with each other by a divalent bonding group; and at least one hydrocarbon-containing group R3 which have 10 to 30 carbon atoms and optionally contain a substituent group, and which is covalently bonded to the same recurring units. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4992244-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4988570-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6074744-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5071694-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9519188-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5359204-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015286100-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5166307-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5071733-A |
| priorityDate |
1986-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |