Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_02ff914937eb6ceaee5ca69cc56cbfa7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_87fd5d655aeec4315b47849d0b541969 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-301 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-302 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-325 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-00 |
filingDate |
1984-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
1985-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_176ddc4b185d5c960a0e5fd08b3fed80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8ab5153164da9a30be2d48134d573ed http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ccf64922c45aeb82e572686f5aa16e04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f0324cbfb30da7713e4cb8859b90c8ca |
publicationDate |
1985-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-4560640-A |
titleOfInvention |
Photosensitive high polymer, easily insolubilized when cross-linked by light, a method for preparation thereof, and a composition thereof |
abstract |
A photosensitive high polymer which is a random copolymer comprising a structural unit represented by the formula <IMAGE> (I) wherein A is <IMAGE> +TR <IMAGE> wherein R is hydrogen, methyl or methoxy and a structural unit represented by the formula <IMAGE> (II) the polymer containing about 5 to about 80 mole % of structural units of the formula (I) and having a polymerization degree of about 300 to about 3000, a process for preparing the photosensitive high polymer and a composition comprising the photosensitive high polymer and solvent. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/FR-2791056-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/NL-1014639-C2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5898000-A |
priorityDate |
1983-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |