| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ba54aff29064e18f1e36be0d4d17be67 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-72 |
| filingDate |
1983-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1985-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2707e143e43a629b89c9778645513f5f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e24b0fd3a9430b158b4205953017b5b |
| publicationDate |
1985-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-4556629-A |
| titleOfInvention |
Developer composition for positive photoresists using solution with cyclic quaternary ammonium hydroxides |
| abstract |
A method of developing a positive photoresist layer which has been image-wise-exposed comprising contacting the layer with an alkaline developing composition to remove exposed areas of the layer, the developing composition comprising a solution containing a cyclic quaternary ammonium hydroxide developing agent in a sufficient concentration to remove exposed areas of the layer. The present invention also includes a developing composition for use in the method. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014377952-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4996627-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4776892-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4801519-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107608182-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5259888-A |
| priorityDate |
1983-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |